| 摘要 |
<p>A solid-state imaging device 1 is arranged so that a hollow section 9 is formed between a solid-state imaging element 2 and a covering section 4 and an air path 7 is formed in an adhesive section 5 so as to extend from the hollow section 9 to the outside, wherein the adhesive section 5 is formed so as not to be positioned on a signal processing section 8 for processing a signal of the solid-state imaging element 2. This makes it possible to reduce noises occurring in the signal processing section of the semiconductor element while preventing occurrence of condensation in the covering section for covering the semiconductor element.</p> |
