发明名称 |
SYSTEM AND METHOD OF OPENING A LOAD LOCK DOOR VALVE AT A DESIRED PRESSURE AFTER VENTING |
摘要 |
A system and method for reducing particulate contamination during the loading and unloading of semiconductor substrates into a load lock chamber of a semiconductor processing tool. One sensor that measures the differential pressure between the inside of the load lock and the outside atmosphere is provided. The method uses an algorithm that predicts when to stop the load lock vent so that a small, positive, repeatable pressure burst is delivered each time the door opens. This algorithm will automatically adjust for changes in the vent rate and response times of system vent components. |
申请公布号 |
WO2016089600(A1) |
申请公布日期 |
2016.06.09 |
申请号 |
WO2015US61275 |
申请日期 |
2015.11.18 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
POMERLEAU, BRADLEY M.;WILSON, ERIC D. |
分类号 |
H01L21/677;H01L21/02;H01L21/67 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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