发明名称 EXPOSURE EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To simply and highly accurately detect or confirm a focusing state in an exposure equipment.SOLUTION: By projecting a pattern array PT constructed by a bar shape patterns PL1 to PL4 while moving a stage 12 to a shading part 40 to which slits ST1 to ST6 is formed, a light quantity signal is outputted from a photosensor PD. Thus, it is determined whether or not the focusing state is maintained based on an amplitude ratio M obtained by the light quantity signal.SELECTED DRAWING: Figure 8
申请公布号 JP2016111197(A) 申请公布日期 2016.06.20
申请号 JP20140247283 申请日期 2014.12.05
申请人 ORC MANUFACTURING CO LTD 发明人 OKUYAMA TAKASHI
分类号 H01L21/027;G02B7/28;G03F7/20 主分类号 H01L21/027
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