发明名称 |
ABRASIVE MATERIAL, METHOD FOR PRODUCING SAME, AND ABRASIVE SLURRY CONTAINING SAME |
摘要 |
A polishing material including polishing abrasive grains, the polishing abrasive grain having a core material that includes a metal oxide, and a cover layer that is provided on a surface of the core material and includes an oxide of a metal, that is different from the core material, or an oxide of a semimetal. When the polishing abrasive grains are observed with a scanning electron microscope after boiling a slurry including the polishing abrasive grains for 5 hours, a ratio of a longitudinal axis to a lateral axis of the polishing abrasive grain is 1.0 or greater and less than 1.5. The polishing abrasive grain preferably has a mass ratio of the cover layer to the core material, cover layer/core material, of from 0.3 mass % to 30 mass % inclusive. The cover layer preferably has a thickness of from 0.2 nm to 500 nm inclusive. |
申请公布号 |
US2016222265(A1) |
申请公布日期 |
2016.08.04 |
申请号 |
US201415021434 |
申请日期 |
2014.08.29 |
申请人 |
MITSUI MINING & SMELTING CO., LTD. |
发明人 |
OGATA Sumikazu;TOKUCHI Shigeki;MARUYAMA Yohei;OSHIKA Motomi |
分类号 |
C09K3/14 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
1. A polishing material comprising polishing abrasive grains, the polishing abrasive grain having a core material that includes a metal oxide, and a cover layer that is provided on a surface of the core material and includes an oxide of a metal, that is different from the core material, or an oxide of a semimetal, wherein,
when the polishing abrasive grains are observed with a scanning electron microscope after boiling a slurry including the polishing abrasive grains for 5 hours, a ratio of a longitudinal axis to a lateral axis of the polishing abrasive grain is 1.0 or greater and less than 1.5. |
地址 |
Tokyo JP |