发明名称 ABRASIVE MATERIAL, METHOD FOR PRODUCING SAME, AND ABRASIVE SLURRY CONTAINING SAME
摘要 A polishing material including polishing abrasive grains, the polishing abrasive grain having a core material that includes a metal oxide, and a cover layer that is provided on a surface of the core material and includes an oxide of a metal, that is different from the core material, or an oxide of a semimetal. When the polishing abrasive grains are observed with a scanning electron microscope after boiling a slurry including the polishing abrasive grains for 5 hours, a ratio of a longitudinal axis to a lateral axis of the polishing abrasive grain is 1.0 or greater and less than 1.5. The polishing abrasive grain preferably has a mass ratio of the cover layer to the core material, cover layer/core material, of from 0.3 mass % to 30 mass % inclusive. The cover layer preferably has a thickness of from 0.2 nm to 500 nm inclusive.
申请公布号 US2016222265(A1) 申请公布日期 2016.08.04
申请号 US201415021434 申请日期 2014.08.29
申请人 MITSUI MINING & SMELTING CO., LTD. 发明人 OGATA Sumikazu;TOKUCHI Shigeki;MARUYAMA Yohei;OSHIKA Motomi
分类号 C09K3/14 主分类号 C09K3/14
代理机构 代理人
主权项 1. A polishing material comprising polishing abrasive grains, the polishing abrasive grain having a core material that includes a metal oxide, and a cover layer that is provided on a surface of the core material and includes an oxide of a metal, that is different from the core material, or an oxide of a semimetal, wherein, when the polishing abrasive grains are observed with a scanning electron microscope after boiling a slurry including the polishing abrasive grains for 5 hours, a ratio of a longitudinal axis to a lateral axis of the polishing abrasive grain is 1.0 or greater and less than 1.5.
地址 Tokyo JP