Apparatus and method for generating interference fringe pattern

摘要

An apparatus for generating holograms includes a laser source configured to emit a laser beam with a frequency of v; an acoustic optical modulator configured to generate, from the laser beam, a first beam with a frequency of v1 and a second beam with a frequency of v2; a first beam splitter configured to split the first beam into a first reference beam and a first object beam, the first object beam being led to a sample; a second beam splitter configured to split the second beam into a second reference beam and a second object beam, the second object beam being led to the sample; and a detector configured to detect an image composed of a first fringe, based on the first reference beam and the first object beam, and a second fringe, based on the second reference beam and the second object beam.

主权项

1. An apparatus for detecting an interference fringe pattern comprising:
a laser source configured to emit a laser beam with a frequency of v, an acoustic optical modulator configured to generate, from the laser beam, a first beam with a frequency of v1 and a second beam with a frequency of v2 different from the frequency of v1; a first beam splitter configured to split the first beam into a first reference beam and a first object beam, the first object beam being led to a sample with a first incident angle; a second beam splitter configured to split the second beam into a second reference beam and a second object beam, the second object beam being led to the sample with a second incident angle different from the first incident angle; and a detector configured to detect, at an exposure time, an image composed of a first interference fringe pattern, based on the first reference beam and the first object beam, and a second interference fringe pattern, based on the second reference beam and the second object beam, wherein the inverse of Δv (Δv=|v2−v1|) is shorter than the exposure time so that the detector does not detect interference fringe patterns due to a first pair of the first and second reference beams, a second pair of the first and second object beams, a third pair of the first reference beam and the second object beam, and a fourth pair of the second reference beam and the first object beam, and wherein the exposure time is set at milli-second order and the inverse of Δv is set at sub micro-second order.