| 摘要 |
The invention pertains to an apparatus for continuously producing silicon oxide, provided with: a reaction chamber for generating silicon oxide gas by reacting a mixed raw material powder containing silicon dioxide powder; a raw material supply mechanism for supplying the mixed raw material powder to the inside of this reaction chamber; an expandable/contractible bellows-shaped substrate for depositing the silicon oxide gas as solid silicon oxide on the surface thereof; a deposition chamber in which the substrate is placed; a transport pipe for transporting the silicon oxide gas from the reaction chamber to the deposition chamber; an expansion/contraction mechanism for expanding and contracting the substrate; and a load lock chamber connected to the deposition chamber via a gate valve. The invention makes it possible to efficiently and stably produce high-purity silicon oxide over an extended period of time. |
