发明名称 |
Junction field effect transistor cell with lateral channel region |
摘要 |
A junction field effect transistor cell of a semiconductor device includes a top gate region, a lateral channel region and a buried gate region arranged along a vertical direction. The lateral channel region includes first zones of a first conductivity type and second zones of a second conductivity type which alternate along a lateral direction perpendicular to the vertical direction. A pinch-off voltage of the junction field effect transistor cell does not depend, or only to a low degree depends, on a vertical extension of the lateral channel region. |
申请公布号 |
US9425327(B2) |
申请公布日期 |
2016.08.23 |
申请号 |
US201314083023 |
申请日期 |
2013.11.18 |
申请人 |
Infineon Technologies AG |
发明人 |
Konrath Jens Peter;Schulze Hans-Joachim |
分类号 |
H01L29/10;H01L29/808;H01L29/66;H01L21/266;H01L21/04;H01L29/16;H01L21/265;H01L29/20 |
主分类号 |
H01L29/10 |
代理机构 |
Murphy, Bilak & Homiller, PLLC |
代理人 |
Murphy, Bilak & Homiller, PLLC |
主权项 |
1. A semiconductor device, comprising:
a junction field effect transistor cell comprising a top gate region, a lateral channel region and a buried gate region arranged along a vertical direction, wherein the lateral channel region comprises first zones of a first conductivity type and second zones of a second conductivity type, the first and second zones alternating along a lateral direction perpendicular to the vertical direction, and the top and buried gate regions have the second conductivity type and the second zones directly adjoin the top gate region. |
地址 |
Neubiberg DE |