发明名称 Junction field effect transistor cell with lateral channel region
摘要 A junction field effect transistor cell of a semiconductor device includes a top gate region, a lateral channel region and a buried gate region arranged along a vertical direction. The lateral channel region includes first zones of a first conductivity type and second zones of a second conductivity type which alternate along a lateral direction perpendicular to the vertical direction. A pinch-off voltage of the junction field effect transistor cell does not depend, or only to a low degree depends, on a vertical extension of the lateral channel region.
申请公布号 US9425327(B2) 申请公布日期 2016.08.23
申请号 US201314083023 申请日期 2013.11.18
申请人 Infineon Technologies AG 发明人 Konrath Jens Peter;Schulze Hans-Joachim
分类号 H01L29/10;H01L29/808;H01L29/66;H01L21/266;H01L21/04;H01L29/16;H01L21/265;H01L29/20 主分类号 H01L29/10
代理机构 Murphy, Bilak & Homiller, PLLC 代理人 Murphy, Bilak & Homiller, PLLC
主权项 1. A semiconductor device, comprising: a junction field effect transistor cell comprising a top gate region, a lateral channel region and a buried gate region arranged along a vertical direction, wherein the lateral channel region comprises first zones of a first conductivity type and second zones of a second conductivity type, the first and second zones alternating along a lateral direction perpendicular to the vertical direction, and the top and buried gate regions have the second conductivity type and the second zones directly adjoin the top gate region.
地址 Neubiberg DE