RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, PHOTOREACTIVE QUENCHER, AND COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide a resist composition, a resist pattern forming method, a photoreactive quencher, and a compound.SOLUTION: The resist composition, which generates an acid upon exposure and whose solubility in a developer changes by the action of an acid, contains: a base component (A) whose solubility in a developer changes by the action of an acid; an acid generator component (B) which generates an acid upon exposure; and a photoreactive quencher (D0). The photoreactive quencher (D0) contains a compound (D0-1) represented by general formula (d0) [where Rarepresents an aromatic ring; Rais a ≥5C alkyl group which may have a substituent; and Raand Raare each independently a 1-10C alkyl group which may have a substituent].SELECTED DRAWING: None