发明名称 Body-Tied, Strained-Channel Multi-Gate Device and Methods
摘要 A fin-FET or other multi-gate transistor is disclosed. The transistor comprises a semiconductor substrate having a first lattice constant, and a semiconductor fin extending from the semiconductor substrate. The fin has a second lattice constant, different from the first lattice constant, and a top surface and two opposed side surfaces. The transistor also includes a gate dielectric covering at least a portion of the top surface and the two opposed side surfaces, and a gate electrode covering at least a portion of the gate dielectric. The resulting channel has a strain induced therein by the lattice mismatch between the fin and the substrate. This strain can be tuned by selection of the respective materials.
申请公布号 US2016322463(A1) 申请公布日期 2016.11.03
申请号 US201615206129 申请日期 2016.07.08
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Lin Hong-Nien;Lin Horng-Chih;Huang Tiao-Yuan
分类号 H01L29/10;H01L29/161;H01L29/66;H01L29/16;H01L27/088;H01L21/8238;H01L29/78;H01L29/165 主分类号 H01L29/10
代理机构 代理人
主权项 1. A device comprising: a substrate having a first lattice constant; extending from the substrate a fin having a second lattice constant, different than the first lattice constant, the fin having a continuous crystalline structure with the substrate; and a cap layer on the fin, the cap layer having continuous crystalline structure with the fin and having a lattice constant different from the second lattice constant.
地址 Hsin-Chu TW