发明名称 SEMICONDUCTOR DEVICE INCLUDING STRUCTURE TO CONTROL UNDERFILL MATERIAL FLOW
摘要 A semiconductor device includes a substrate, a semiconductor chip, and an array of contact elements electrically coupling the substrate to the semiconductor chip. The semiconductor device includes an underfill material between the substrate and the semiconductor chip and between the contact elements. A patterned structure is arranged on the substrate and extends from under the semiconductor chip through a keep-out zone around an edge of the semiconductor chip. The patterned structure provides a reservoir for the underfill material.
申请公布号 US2016365258(A1) 申请公布日期 2016.12.15
申请号 US201514734544 申请日期 2015.06.09
申请人 Infineon Technologies AG 发明人 Munding Andreas
分类号 H01L21/56;H01L23/31;H01L25/00;H01L23/00;H01L25/065 主分类号 H01L21/56
代理机构 代理人
主权项 1. A semiconductor device comprising: a substrate; a semiconductor chip; an array of contact elements, a first portion of the array of contact elements electrically coupling the substrate to the semiconductor chip; underfill material between the substrate and the semiconductor chip and between the contact elements; and a patterned structure arranged on the substrate and extending from under the semiconductor chip through a keep-out zone around an edge of the semiconductor chip, the patterned structure providing a reservoir for the underfill material, wherein the patterned structure comprises a second portion of the array of contact elements that do not electrically contact the semiconductor chip.
地址 Neubiberg DE