发明名称 Process for treating periphery of unexposed photosensitive resin plate
摘要 A process for treating the periphery of an unexposed photosensitive resin plate, which comprises irradiation of light having a wavelength of not longer than 300 nm on the periphery of the unexposed photosensitive resin plate until the periphery is free of stickiness. The process of the present invention solves problems such as sticking of the peripheral resin of unexposed plates to packages, sticking of unexposed resin to a working table, exposure table or vacuum adhesion sheet, sticking of dust, and so on on the periphery of unexposed plates, and sticking of unexposed resin to hands when handling, while eliminating all defects in handling during the steps of making printing plates.
申请公布号 US6150076(A) 申请公布日期 2000.11.21
申请号 US19920839173 申请日期 1992.02.19
申请人 TOYO BOSEKI KABUSHIKI KAISHA 发明人 YAMAMOTO, KATSUMASA;ARIKI, TAKAMITSU;ONODERA, KOSAKU;NAMPEI, MASARU
分类号 G03F7/20;(IPC1-7):G03C5/00;B41M5/00 主分类号 G03F7/20
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