发明名称 PROCESSING APPARATUS AND PROCESSING METHOD OF STACK
摘要 A processing apparatus of a stack is provided. The stack includes two substrates attached to each other with a gap provided between their end portions. The processing apparatus includes a fixing mechanism that fixes part of the stack, a plurality of adsorption jigs that fix an outer peripheral edge of one of the substrates of the stack, and a wedge-shaped jig that is inserted into a corner of the stack. The plurality of adsorption jigs include a mechanism that allows the adsorption jigs to move separately in a vertical direction and a horizontal direction. The processing apparatus further includes a sensor sensing a position of the gap between the end portion in the stack. A tip of the wedge-shaped jig moves along a chamfer formed on an end surface of the stack. The wedge-shaped jig is inserted into the gap between the end portions in the stack.
申请公布号 US2016243812(A1) 申请公布日期 2016.08.25
申请号 US201615147020 申请日期 2016.05.05
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 KUMAKURA Kayo;AOYAMA Tomoya;CHIDA Akihiro;YOKOYAMA Kohei;OHNO Masakatsu;IDOJIRI Satoru;IKEDA Hisao;ADACHI Hiroki;HIRAKATA Yoshiharu;EGUCHI Shingo;JINBO Yasuhiro
分类号 B32B43/00;H01L21/67;H01L51/56 主分类号 B32B43/00
代理机构 代理人
主权项 1. (canceled)
地址 Atsugi-shi JP