发明名称 |
PROCESSING APPARATUS AND PROCESSING METHOD OF STACK |
摘要 |
A processing apparatus of a stack is provided. The stack includes two substrates attached to each other with a gap provided between their end portions. The processing apparatus includes a fixing mechanism that fixes part of the stack, a plurality of adsorption jigs that fix an outer peripheral edge of one of the substrates of the stack, and a wedge-shaped jig that is inserted into a corner of the stack. The plurality of adsorption jigs include a mechanism that allows the adsorption jigs to move separately in a vertical direction and a horizontal direction. The processing apparatus further includes a sensor sensing a position of the gap between the end portion in the stack. A tip of the wedge-shaped jig moves along a chamfer formed on an end surface of the stack. The wedge-shaped jig is inserted into the gap between the end portions in the stack. |
申请公布号 |
US2016243812(A1) |
申请公布日期 |
2016.08.25 |
申请号 |
US201615147020 |
申请日期 |
2016.05.05 |
申请人 |
Semiconductor Energy Laboratory Co., Ltd. |
发明人 |
KUMAKURA Kayo;AOYAMA Tomoya;CHIDA Akihiro;YOKOYAMA Kohei;OHNO Masakatsu;IDOJIRI Satoru;IKEDA Hisao;ADACHI Hiroki;HIRAKATA Yoshiharu;EGUCHI Shingo;JINBO Yasuhiro |
分类号 |
B32B43/00;H01L21/67;H01L51/56 |
主分类号 |
B32B43/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. (canceled) |
地址 |
Atsugi-shi JP |