发明名称 |
PATTERN FORMING METHOD AND PATTERN FORMING APPARATUS |
摘要 |
In a pattern forming method of an embodiment, a template pattern formed on a front side of a template is brought into contact with resist placed on a substrate. Moreover, in the pattern forming method, rear pressure being an ambient pressure on a back side of the template is adjusted to a second pressure. Moreover, in the pattern forming method, the resist is filled in the template pattern under the second pressure to be cured. |
申请公布号 |
US2016243753(A1) |
申请公布日期 |
2016.08.25 |
申请号 |
US201514844538 |
申请日期 |
2015.09.03 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
HATANO Masayuki;KAWAMURA Yoshihisa |
分类号 |
B29C59/02 |
主分类号 |
B29C59/02 |
代理机构 |
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代理人 |
|
主权项 |
1. A pattern forming method comprising:
bringing a template pattern formed on a front side of a template into contact with resist placed on a substrate; adjusting, to a first pressure, pressure inside an apparatus on which the template is placed; adjusting, to a second pressure, rear pressure being ambient pressure on a back side of the template, the second pressure being lower than the first pressure; filling the resist in the template pattern under the second pressure; and curing the resist. |
地址 |
Tokyo JP |