| 摘要 |
PROBLEM TO BE SOLVED: To provide a light-transmissive film which is capable of suppressing generation of an overetched portion while both a first inorganic oxide layer and a second inorganic oxide layer can be surely patterned by etching.SOLUTION: A light-transmissive film 1 includes a transparent substrate 2 and a light-transmissive inorganic layer 4 in order. The transparent substrate 2 is formed of a polymer film. The light-transmissive inorganic layer 4 includes a first inorganic oxide layer 5, a metal layer 6, and a second inorganic oxide layer 7 in order. The light-transmissive inorganic layer 4 has conductivity. The first inorganic oxide layer 5 and the second inorganic oxide layer 7 contain hydrogen atoms. The ratio (H2/H1) of the content H2 of hydrogen atoms in the second inorganic oxide layer 7 to the content H1 of hydrogen atoms in the first inorganic oxide layer 5 is 0.10 to 10.00 inclusive.SELECTED DRAWING: Figure 1 |
