发明名称 Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna
摘要 A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
申请公布号 US9449794(B2) 申请公布日期 2016.09.20
申请号 US201414270578 申请日期 2014.05.06
申请人 APPLIED MATERIALS, INC. 发明人 Nguyen Andrew;Ramaswamy Kartik;Kenney Jason A.;Rauf Shahid;Collins Kenneth S.;Yang Yang;Lane Steven;Vishwanath Yogananda Sarode
分类号 H01J7/24;H01J37/32;C23C16/455;C23C16/509;H05H1/46 主分类号 H01J7/24
代理机构 代理人 Wallace Robert M.
主权项 1. A plasma reactor comprising: a window assembly; first and second coil antennas adjacent said window assembly, said first coil antenna comprising a first layer of parallel spiral conductors, each of said parallel spiral conductors comprising first and second ends; a first current distributor coupled to the first ends of the parallel spiral conductors of said first layer; a conductive ground plate in a plane overlying said first current distributor; and a first radial conductive feed rod lying in a plane above said conductive ground plate and having an inner end coupled to said first current distributor and an outer end comprising a first RF feed terminal; wherein said first current distributor comprises: a first conductive spider lying in a plane above said first and second coil antennas, and a plurality of axial posts connected between a peripheral annular zone of said first conductive spider and said first ends of first layer of parallel spiral conductors.
地址 Santa Clara CA US