METHOD FOR DEPOSITING ORGANOSICATE LAYER

摘要

PROBLEM TO BE SOLVED: To provide a method for forming an organosilicate layer. SOLUTION: The organosilicate layer is formed by applying electric field to a gaseous mixture containing an organosilane compound and an oxygen- containing gas. The organosilicate layer can be applied to an integrated circuit production process. In one integrated circuit production process, the organosilicate layer is used as an intermetallic dielectric layer. In another integrated circuit production process, the organosilicate layer is incorporated into a damascene structure.