发明名称 |
FARADAY SYSTEM FOR ION IMPLANTERS |
摘要 |
A Faraday system for measuring ion beam current in an ion implanter or other ion beam treatment system includes a Faraday cup body defining a chamber which has an entrance aperture for receiving an ion beam, a suppression electrode positioned in proximity to the entrance aperture to produce electric fields for inhibiting escape of electrons from the chamber, and a magnet assembly positioned to produce magnetic fields for inhibiting escape of electrons from the chamber. The chamber may have a relatively small ratio of chamber depth to entrance aperture width. |
申请公布号 |
WO0223582(A3) |
申请公布日期 |
2002.08.15 |
申请号 |
WO2001US28671 |
申请日期 |
2001.09.14 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
BISSON, JACK;ZHAO, ZHIYONG;GAMMEL, GEORGE;ALVARADO, DANIEL;WALKER, CRAIG |
分类号 |
C23C14/48;H01J37/04;H01J37/244;H01J37/317;H01L21/265 |
主分类号 |
C23C14/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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