PHOTOMASK AND EXPOSURE METHOD USING SAME

摘要

A photomask (1) is composed of a transparent base material (2) and a light shielding film (3) formed on one plane of the transparent base material (2). The photomask is provided with a plurality of mask patterns (4) which are arranged in one direction on the light shielding film (2) and permit exposure light to pass through, and an inspection window (5), which is formed on a side in an arrangement direction of the mask patterns (4) on the light shielding film (3), to permit the surface of a color filter substrate arranged to face the photomask to be observed. Thus, superposition accuracy of an exposure pattern to a reference pattern of a substrate whereupon a photosensitive resin is applied is improved.