MANUFACTURING METHOD OF LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, AND MANUFACTURING METHOD OF ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a technology that is advantageous for easily adjusting an optical axis of a measurement part which measures relative positions of a radiation part and a stage.SOLUTION: A lithographic apparatus includes: a base; a stage which is supported on the base, holds a substrate, and may move relative to the base; a chamber storing the base and the stage; a measurement object member fixed to the chamber; and a head part which is supported by the base and used to measure a position of the measurement object member. A manufacturing method of the lithographic apparatus, which forms patterns on substrates, includes: a first step in which the measurement object member is positioned relative to the base by using a positioning member for defining a physical relationship between the base and the measurement object member; a second step in which a measuring shaft of the head part is adjusted relative to the measurement object member positioned in the first step; and a third step in which the base is stored in the chamber after the second step.SELECTED DRAWING: Figure 1