| 摘要 |
Provided is a recovery method for an abrasive, with which it is possible to recover a highly pure abrasive from a recovery slurry that contains a used abrasive, by a simple method. This recovery method for an abrasive for recovering an abrasive from an abrasive slurry that has been employed in polishing an object to be polished containing silicon as the main component is characterized in that the object-to-be-polished component is removed and the abrasive recovered, through at least the following step 1 to step 3, under conditions in which no pH-adjusting agent is used. Step 1: a step for adding a solvent to the abrasive slurry; step 2: a step for dissolving particles of the object to be polished, from the object-to-be-polished component contained in the abrasive slurry; step 3: filtering the abrasive slurry and recovering the abrasive. |
