SLOPED TERMINATION IN MOLYBDENUM LAYERS AND METHOD OF FABRICATING

摘要

A method (800) of fabricating a sloped termination of a molybdenum layer includes providing a molybdenum layer (802) and applying a photo resist material to the molybdenum layer (804). The photo resist material is exposed under a defocus condition to generate a mask (806), an edge of the exposed photo resist material corresponding to the sloped termination. The molybdenum layer is etched with an etching material, wherein the etching material at least partially etches the photo resist material exposed under the defocused condition, and wherein the etching resulting in the sloped termination (808).