发明名称 Back-biased face target sputtering based high density non-volatile data storage
摘要 Systems and methods are disclosed for forming stacked substrates with data storage arrays formed on each substrate in an air-tight chamber in which an inert gas is admittable and exhaustible; a pair of target plates placed at opposite ends of said air-tight chamber respectively so as to face each other and form a plasma region therebetween; a pair of magnets respectively disposed adjacent to said target plates such that magnet poles of different polarities face each other across said plasma region thereby to establish a magnetic field of said plasma region between said target plates; a substrate holder disposed adjacent to said plasma region, said substrate holder adapted to hold a substrate on which an alloyed thin film is to be deposited; and a back-bias power supply coupled to the substrate holder.
申请公布号 US2007084716(A1) 申请公布日期 2007.04.19
申请号 US20050252278 申请日期 2005.10.16
申请人 发明人 NAGASHIMA MAKOTO
分类号 C23C14/00;C23C14/32 主分类号 C23C14/00
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