Chemical amplification resist composition and pattern-forming method using the same,申请号EP20050017956-传众专利搜索

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发明名称	Chemical amplification resist composition and pattern-forming method using the same
摘要
申请公布号	EP1628159(A3)	申请公布日期	2008.04.16
申请号	EP20050017956	申请日期	2005.08.18
申请人	FUJIFILM CORPORATION	发明人	TARUTANI, SHINJI;TAKAHASHI, HYOU;WADA, KENJI
分类号	G03F7/004;G03F7/039	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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