| 摘要 |
A thin film deposition apparatus and method are provided to progress the deposition process after confirming that a substrate is accurately mounted on the support, thereby preventing abnormal deposition. A thin film deposition apparatus comprises a chamber(10), a support(20) which is located in the chamber to mount a substrate, a cover(30) forming a process chamber by contacting the support, and a substrate mounting error detector. The substrate mounting error detector is composed of a light source(110) installed in the chamber, a reflector(120) which totally reflects the light irradiated from the light source to the substrate, a collimator(130) controlling the quantity of light reflected from the substrate, and a light receiving sensor(140) sensing the light passing through the collimator.
|
