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1. A chemically amplified positive photosensitive resin composition, comprising:
(A) an acid generator that produces an acid by being irradiated with an active ray or radiation, (B) a resin whose solubility in alkali increases under the action of acid, and (S) an organic solvent, wherein the resin (B) comprises an acrylic resin (B-3) comprising a constituent unit derived from an acrylic acid ester comprising a lactone-containing cyclic group provided that the acrylic resin (B-3) does not comprise a constituent unit derived from an acrylic acid ester comprising an —SO2-containing cyclic group, and the acrylic resin (B-3) further comprises at least one constituent unit selected from the group consisting of constituent units represented by the following formulae (b5) to (b7), provided that the constituent unit represented by the formula (b5) does not comprise a constituent unit represented by the following formula (b5-5):wherein R14b and R18b to R23b in the above formulae (b5) to (b7) are each independently a hydrogen atom, a linear or branched alkyl group having 1 to 6 carbon atoms, a fluorine atom or a linear or branched fluorinated alkyl group having 1 to 6 carbon atoms, R15b to R17b are each independently a linear or branched alkyl group having 1 to 6 carbon atoms or a linear or branched fluorinated alkyl group having 1 to 6 carbon atoms, R16b and R17b may join each other to form a hydrocarbon ring having 5 to 20 carbon atoms together with a carbon atom to which both are attached, Yb represents an aliphatic cyclic group or an alkyl group optionally having a substituent, p is an integer of 0 to 4, and q is 0 or 1, and R24b in the above formula (b5-5) represents a hydrogen atom or a methyl group,
wherein the resin (B) has mass-average molecular weights (Mw) of 20,000 to 400,000, and the percentage of the acrylic resin (B-3) to the total mass of resin components contained in the composition is 70% by mass or more. |
