Photoresist composition, compound and process of producing photoresist pattern

摘要

A photoresist composition comprising
a resin having an acid-labile group,an acid generator, anda compound represented by formula (I0).;

主权项

1. A photoresist composition comprising
a resin having an acid-labile group, an acid generator, and a compound represented by formula (I0): wherein R01 represents a R3—CO—O— where R3 represents a C1-C22 hydrocarbon group in which a methylene group has been replaced by an oxygen atom or a carbonyl group or in which a hydrogen atom has been replaced by a hydroxy group, a nitro group or a halogen atom; R02 each independently represents a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group, a hydroxy group or a halogen atom; and m represents an integer of 0 to 4.