发明名称 Liquid crystal display device
摘要 It is an object to provide a display having high visibility and a transflective type liquid crystal display device having a reflection electrode having a concavo-convex structure formed without especially increasing the process. During manufacturing a transflective liquid crystal display device, a reflection electrode of a plurality of irregularly arranged island-like patterns and a transparent electrode of a transparent conductive film are layered in forming an electrode having transparent and reflection electrodes thereby having a concavo-convex form to enhance the scattering ability of light and hence the visibility of display. Furthermore, because the plurality of irregularly arranged island-like patterns can be formed simultaneous with an interconnection, a concavo-convex structure can be formed during the manufacturing process without especially increasing the patterning process only for forming a concavo-convex structure. It is accordingly possible to greatly reduce cost and improve productivity.
申请公布号 US9448432(B2) 申请公布日期 2016.09.20
申请号 US200611383286 申请日期 2006.05.15
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 Yamazaki Shunpei;Eguchi Shingo;Shionoiri Yutaka;Fujimoto Etsuko
分类号 G02F1/1335 主分类号 G02F1/1335
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. A liquid crystal display device comprising: a thin-film transistor over a substrate; a transparent conductive film over the thin-film transistor through an insulating film; an interconnection over the transparent conductive film; and a plurality of island-like conductive films over the transparent conductive film, wherein the thin-film transistor and the transparent conductive film are connected to the interconnection, wherein the interconnection is not in contact with the plurality of island-like conductive films, wherein the interconnection is formed from a same layer as the plurality of island-like conductive films, and wherein the plurality of island-like conductive films have an area ratio of 50-90% of an area occupied by the transparent conductive film.
地址 Atsugi-shi, Kanagawa-ken JP