发明名称 |
Liquid crystal display device |
摘要 |
It is an object to provide a display having high visibility and a transflective type liquid crystal display device having a reflection electrode having a concavo-convex structure formed without especially increasing the process. During manufacturing a transflective liquid crystal display device, a reflection electrode of a plurality of irregularly arranged island-like patterns and a transparent electrode of a transparent conductive film are layered in forming an electrode having transparent and reflection electrodes thereby having a concavo-convex form to enhance the scattering ability of light and hence the visibility of display. Furthermore, because the plurality of irregularly arranged island-like patterns can be formed simultaneous with an interconnection, a concavo-convex structure can be formed during the manufacturing process without especially increasing the patterning process only for forming a concavo-convex structure. It is accordingly possible to greatly reduce cost and improve productivity. |
申请公布号 |
US9448432(B2) |
申请公布日期 |
2016.09.20 |
申请号 |
US200611383286 |
申请日期 |
2006.05.15 |
申请人 |
Semiconductor Energy Laboratory Co., Ltd. |
发明人 |
Yamazaki Shunpei;Eguchi Shingo;Shionoiri Yutaka;Fujimoto Etsuko |
分类号 |
G02F1/1335 |
主分类号 |
G02F1/1335 |
代理机构 |
Fish & Richardson P.C. |
代理人 |
Fish & Richardson P.C. |
主权项 |
1. A liquid crystal display device comprising:
a thin-film transistor over a substrate; a transparent conductive film over the thin-film transistor through an insulating film; an interconnection over the transparent conductive film; and a plurality of island-like conductive films over the transparent conductive film, wherein the thin-film transistor and the transparent conductive film are connected to the interconnection, wherein the interconnection is not in contact with the plurality of island-like conductive films, wherein the interconnection is formed from a same layer as the plurality of island-like conductive films, and wherein the plurality of island-like conductive films have an area ratio of 50-90% of an area occupied by the transparent conductive film. |
地址 |
Atsugi-shi, Kanagawa-ken JP |