发明名称 ELECTRONIC DEVICE
摘要 In a conventional electronic device and a method of manufacturing the same, reduction in cost of the electronic device is hindered because resin used in an interconnect layer on the solder ball side is limited. The electronic device includes an interconnect layer (a first interconnect layer) and an interconnect layer (a second interconnect layer). The second interconnect layer is formed on the undersurface of the first interconnect layer. The second interconnect layer is larger in area seen from the top than the first interconnect layer and is extended to the outside from the first interconnect layer.
申请公布号 US2016307875(A1) 申请公布日期 2016.10.20
申请号 US201615191774 申请日期 2016.06.24
申请人 Renesas Electronics Corporation 发明人 KURITA Yoichiro;KAWANO Masaya;SOEJIMA Koji
分类号 H01L25/065;H01L25/00 主分类号 H01L25/065
代理机构 代理人
主权项 1. A electronic device comprising: a substrate having a first main surface, a second main surface opposite the first main surface and a plurality of wirings; a first semiconductor chip arranged above the first main surface and having a first obverse surface, a CPU circuit and a plurality of bumps formed on the first obverse surface; a first memory chip having a first group of electrodes; a second memory chip having a second group of electrodes and through electrodes penetrating the second memory chip in a thickness direction of the second memory chip, the through electrodes being electrically connected to the second group of electrodes; and the first memory chip stacked on the second memory chip over the substrate such that the first group of electrodes of the first memory chip are electrically connected to the through electrodes of the second memory chip, wherein the first group of electrodes of the first memory chip, the second groups of electrodes of the second memory chips are arranged in a first predetermined pitch, and wherein the bumps of the first semiconductor chip, the second groups of electrodes of the second memory chips are electrically connected to the wirings of the substrate.
地址 Tokyo JP