| 摘要 |
PROBLEM TO BE SOLVED: To provide a stencil mask which can prevent or suppress the deterioration of electrically charged particle being irradiated and to provide a semiconductor substrate having high reliability, an electronic device and an electronic apparatus having this. SOLUTION: The stencil mask 1 is installed in the top surface 21 side where an ion beam 501 in the semiconductor substrate 2 is irradiated and used when the ion beam 501 is irradiated and the semiconductor substrate 2 is processed by the irradiated ion beam 501. This stencil mask 1 includes a mask main part 5 in which an aperture 52 corresponding to the irradiation pattern of an ion beam 501 irradiated on the semiconductor substrate 2 is formed, and a resist film 4 laminated to the top surface 51 side where the ion beam 501 of the mask main part 5 is irradiated to protect the mask main part 5 from the ion beam 501. The thickness of the resist film 4 near the edge 521 of the aperture 52 is reduced gradually toward the inside of the aperture 52. COPYRIGHT: (C)2006,JPO&NCIPI
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