发明名称 BASE MATERIAL WITH HARD COAT FILM CONTAINING HOLLOW SILICON-BASED FINE PARTICLES OR ITS AGGREGATE
摘要 PROBLEM TO BE SOLVED: To provide a base material with a hard coating film having high transparency and high film strength by a coating film made of hollow silicon-based fine particles which has high void ratio, shows low refractive index, has high productivity, is hardly broken, and has a particle diameter of 1μm or less of a narrow particle diameter distribution or hollow silicon particle aggregate and matrix resin. SOLUTION: The base material with the hard coat film comprises the base material and a hard coat film formed on the base material, wherein the hard coat film comprises a matrix component, and a hollow silicon-based fine particle aggregate aggregating hollow silicon-based particles and having a volume average particle diameter ranging from 0.04 to 1μm. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009056673(A) 申请公布日期 2009.03.19
申请号 JP20070225394 申请日期 2007.08.31
申请人 KANEKA CORP 发明人 MUKAI RYUTARO;TAKAGI AKIRA
分类号 B32B27/00;B01J13/04;B01J13/20;B32B27/20;C08J3/16;C08J7/04 主分类号 B32B27/00
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