Method and hardware for cleaning UV chambers

摘要

A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NF3 and O2 to remove silicon residues. The UV chamber may have two UV transparent showerheads, which together with a UV window in the chamber lid, define a gas volume proximate the UV window and a distribution volume below the gas volume. A purge gas may be flowed through the gas volume while one or more of the cleaning gases is flowed into the distribution volume to prevent the cleaning gases from impinging on the UV transparent window.

主权项

1. An apparatus for processing a substrate, comprising:
a chamber enclosing a substrate support; a UV source positioned to illuminate the substrate support; and a chamber lid, comprising:
a window substantially transparent to UV radiation between the UV source and the substrate support;a first showerhead between the window and the substrate support, the first showerhead comprising a plurality of through holes wherein a size of the through holes is larger at a periphery of the showerhead than at a central portion of the showerhead, the window and the first showerhead creating a gas volume, the gas volume to receive UV radiation from the UV source; anda second showerhead between the first showerhead and the substrate support, the first showerhead and the second showerhead creating a distribution volume, the distribution volume to receive UV radiation from the UV source, wherein the gas volume and the distribution volume are in fluid communication, wherein each of the first and second showerheads is substantially transparent to UV radiation.