Beam Guiding Apparatus

摘要

In one implementation, a beam guiding apparatus includes a vacuum chamber that includes a target region arranged to receive a target material for generating EUV radiation. The vacuum chamber further includes a first opening for receiving into the vacuum chamber a first laser beam and a second opening for receiving into the vacuum chamber a second laser beam. The vacuum chamber also includes a superposition apparatus arranged to superpose the first laser beam having a first wavelength and a second laser beam having a second wavelength for common beam guidance in the direction of the target region. The vacuum chamber also includes a beam shaping apparatus arranged upstream of the superposition apparatus in the beam path of the second laser beam, wherein the beam shaping apparatus is configured to set a ring-shaped beam profile of the second laser beam, The first and second laser beam have different wavelengths.

主权项

1. A beam guiding apparatus, comprising:
a vacuum chamber comprising a target region arranged to receive a target material for generating EUV radiation, wherein the vacuum chamber further comprises a first opening for receiving into the vacuum chamber a first laser beam and a second opening for receiving into the vacuum chamber a second laser beam; a superposition apparatus arranged to superpose the first laser beam having a first wavelength and a second laser beam having a second wavelength for common beam guidance in the direction of the target region; a beam shaping apparatus arranged upstream of the superposition apparatus in the beam path of the second laser beam, wherein the beam shaping apparatus is configured to set a ring-shaped beam profile of the second laser beam, wherein the first laser beam and the second laser beam have different wavelengths.