Millimeter-wave system with beam direction by switching sources

摘要

Various embodiments of a millimeter-wave wireless point-to-point or point-to-multipoint communication system which enables determining preferred directions of transmissions, and transmitting in such preferred directions without routing radio-frequency signals. The system comprises a millimeter-wave focusing element, multiple millimeter-wave antennas, and multiple radio-frequency-integrated circuits (“RFICs”). In various embodiments, preferred directions are determined, and millimeter-wave beams are transmitted in the preferred directions.

主权项

1. A method for controlling a direction of a millimeter-wave beam in a point-to-point millimeter-wave communication system, comprising:
using a first millimeter-wave radiating source, located at a first location on a focal surface of a millimeter-wave focusing element, to transmit a millimeter-wave beam via said millimeter-wave focusing element, wherein said millimeter-wave beam having a first direction consequent upon the first location; determining a desired direction for the millimeter-wave beam, wherein said desired direction is expected to improve performance of a point-to-point millimeter-wave communication system employing the millimeter-wave beam; identifying, out of a plurality of millimeter-wave radiating sources, a second millimeter-wave radiating source located at a second location on the focal surface of the millimeter-wave focusing element, which when in use will result in a second direction for the millimeter-wave beam that is closest to the desired direction for the millimeter-wave beam; and using the second millimeter-wave radiating source to transmit the millimeter-wave beam having the second direction consequent upon the second location, thereby improving performance of the point-to-point millimeter-wave communication system; wherein each of said first and second millimeter-wave radiating sources comprises a radio-frequency-integrated-circuit which is mounted on a printed-circuit-board that is located substantially on said focal surface of said millimeter-wave focusing element or slightly behind said focal surface of said millimeter-wave focusing element.