发明名称 CLEANER FOR LITHOGRAPHY
摘要 <p>PROBLEM TO BE SOLVED: To obtain a cleaner for lithography excellent in resist dissolving power and having high safety to the human body. SOLUTION: The cleaner for lithography is a homogeneous soln. of at least one org. solvent selected from the group comprising a propylene glycol alkyl ether, a propylene glycol alkyl ether acetate, an ethylene glycol alkyl ether, an ethylene glycol alkyl ether acetate, an alkyl acetate, an alkyl propionate, an alkyl al koxypropionate, an alkyl, lactate, an aliphatic ketone (ketones) and an alkoxybutanol and at least one of alcohols having 1-4C alkyl groups. When a mixed soln. of propylene glycol monomethyl ether acetate and ethanol is used, the cleaner is excellent particularly in dissolving power.</p>
申请公布号 JPH1144960(A) 申请公布日期 1999.02.16
申请号 JP19970167593 申请日期 1997.06.24
申请人 KURARIANTO JAPAN KK 发明人 TAKEDA TAKASHI
分类号 G03F7/32;C11D7/26;C11D7/32;C11D7/50;C11D11/00;G03F7/16;G03F7/42;H01L21/027;H01L21/304;H01L21/311;(IPC1-7):G03F7/42 主分类号 G03F7/32
代理机构 代理人
主权项
地址