发明名称 TOTAL REFLECTION X-RAY ANALYSIS DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a total reflection X-ray analysis device suitable for replaced, and used, for an X-ray extraction opening portion in an external X-ray source facility. SOLUTION: An X-ray from an external X-ray source is, through a slit 1 and an incident X-ray detector 2, reflected on the measurement surface of a sample on a sample holding member 3 on a sample stage 4, then made incident on a total reflection X-ray detector 5 of a detector stage 6. The slit 1, the incident X-ray detector 2, and a sample stage 4 are placed on a base stage 7 while the base stage 7 is placed on a vertical movable stage 8, so, by vertically moving the base stage 7, an incident X-ray axis is matched with the measurement surface of sample. The sample stage 4 is turned against the X-ray axis, the sample placed on the sample stage 4 is tilted, and a reflected X-ray from the measurement surface is measured with the reflection X-ray detector 5 which rotates around the center of reflection position of X-ray. The base stage 7 comprises the slit 1, the incident X-ray detector 2, and the sample stage 4, so that the weight of the base stage is reduced for avoiding such defect as deflection.</p>
申请公布号 JPH1144661(A) 申请公布日期 1999.02.16
申请号 JP19970202687 申请日期 1997.07.29
申请人 RICOH CO LTD;RITSUMEIKAN 发明人 IWATA CHIKAYUKI;TANI KATSUHIKO;NISHIKATSU HIDEO
分类号 G01N23/06;G01N23/20;G01N23/201;G21K1/06;(IPC1-7):G01N23/20 主分类号 G01N23/06
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