| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resin compsn. having excellent developing property, sensitivity and resolution which is suitable for a positive resist and having good depth of a focus by incorporating an alkali-soluble resin and a specified 1,2- quinonediazide compd. SOLUTION: This resin compsn. contains an alkali-soluble resin and 1,2-quinone diazide compd. expressed by a formula. In the formula, R<1> to R<6> are independently alkyl groups, cycloalkyl groups or aryl groups, (a) and (b) are independently integers 1 to 3, and D<1> and D<2> are independently hydrogen atoms or 1,2-quinonediazide sulfonyl groups. When a plurality of D<1> is present, at least one D<1> is a 1,2-quinonediazide sulfonyl group. A is a single bond or group expressed by -O-, -S-, -CH2 -, etc., and (x) and (y) are integers 0 to 2. Thereby, the obtd. radiation-sensitive resin compsn. has excellent developing property, sensitivity, and resolution and is suitable for a positive resist having good depth of focus. |
