发明名称 Cleaning method and cleaner device for laminated substrate fabrication apparatus
摘要 A method for cleaning a laminated substrate fabrication apparatus that efficiently cleans a surface used to attract a substrate while enabling stable cleaning. A cleaning unit, which includes an attraction surface for attracting and holding the substrate, is arranged in a processing chamber to clean the attraction surface.
申请公布号 US2006221538(A1) 申请公布日期 2006.10.05
申请号 US20050248164 申请日期 2005.10.13
申请人 FUJITSU LIMITED 发明人 MURAMOTO TAKANORI;KADOWAKI TETSUJI;TAKAYAMA YUKIO;TSUBOI KEN
分类号 H01T23/00 主分类号 H01T23/00
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