发明名称 X-RAY TOPOGRAPHY MEASURING INSTRUMENT, AND X-RAY TOPOGRAPHY MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To attain X-ray section topography having 1μm or less of high space resolution to generate a multi-dimensional clear and uniform topographic image. SOLUTION: A measuring crystal medium is moved along a plurality of directions within a prescribed area including a converged X-ray beam, under the condition where the converged X-ray beam having a prescribed converged beam shape is made to get incident into the measuring crystal medium, and an intensity of a diffracted X-ray beam of the converged X-ray beam obtained by diffraction within the prescribed area in the measuring crystal medium is measured along with the moving to generate the topographic image corresponding to a crystal cut cross-sectional shape, in conformity with the moved direction within the prescribed area in the measuring crystal medium, based on the measured intensity. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007240510(A) 申请公布日期 2007.09.20
申请号 JP20060111094 申请日期 2006.04.13
申请人 FUJI ELECTRIC HOLDINGS CO LTD 发明人 TANUMA RYOHEI
分类号 G01N23/20;H01L21/66 主分类号 G01N23/20
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