| 摘要 |
<p>A method for preventing or reducing contamination of an immersion-type projection apparatus and an immersion-type lithographic apparatus are provided to rinse a part or the entire part of an immersion space with rinsing liquid, before the apparatus is used to project radiation beam on a substrate. A method for preventing or reducing contamination of an immersion-type projection apparatus, which comprises one or more immersion space(10), and an immersion system(12,13) configured to fill the entire or a part of the immersion space with immersion liquid, the method comprises a step of rinsing the entire or a part of the immersion space using the immersion system with rinsing liquid, before the apparatus is used to project radiation beam on a substrate(W).</p> |
