| 摘要 |
The present invention relates to a composition for removing a silicone-based resin. More particularly, the present invention relates to a composition comprising a cyclic quaternary ammonium compound and a nonprotonic solvent for removing a silicone-based resin. The composition for removing a silicone-based resin has an excellent rate of decomposing a resin, and can effectively remove remaining silicone-based resins during a manufacturing process of an electronic part, or the like. For example, the composition can remove silicone-based resins remaining on a support body and a wafer circuit surface during processes such as back grinding of a semiconductor wafer, forming a double-faced electrode, and the like. |
