STEREOLlTHOGRAPHY MACHINE WITH IMPROVED OPTICAL UNIT

摘要

The invention relates to a Stereolithography machine (1) comprising: • a container (2) for a fluid substance (15) suited to be solidified through exposure to predefined radiation (3a); • a laser source (3) apt to emit a beam of said predefined radiation (3a); • a vector scanning optical unit (4) configured to perform a vector scanning of a reference surface (5) arranged inside said container (2) according to a desired vector data image by means of said predefined radiation; • a memory to store said vector data image representative of an image to be scanned on said reference surface; • a logic control unit (6) configured for controlling said vector scanning optical unit (4) and/or said laser source (3) in such a way as to expose a predefined portion of said reference surface (5) to said radiation (3a) according to said vector data image; wherein said vector scanning optical unit (4) comprises a first and a second micro- opto-electromechanical systems (MOEMS) (7, 8) arranged in series one after the other with respect to a travelling path of said predefined radiation, each MOEMS system comprising: • a mirror (9) having a diameter comprised between about 2 mm and about 8 mm associated with a supporting structure (10) through articulation means (11) configured so as to define for said mirror (9) a rotation axis (X1, X2); • an actuator (12) suited to move said mirror (9) around said rotation axis (X1, X2) in a quasi-static manner at an angular speed so that a corresponding marking speed of said laser beam on said reference surface (5) is comprised between about 0.5 m/s and about 3 m/s when said laser source (3) is emitting said predetermined radiation (3a) during said vector scanning; and wherein • the rotation axis (X1) of the mirror (9) of the first MOEMS system (7) is incident to the rotation axis (X2) of the mirror (9) of the second MOEMS system (8).