发明名称 |
AQUEOUS SLURRY CONTAINING METALLATE-MODIFIED SILICA PARTICLES |
摘要 |
Provided is a novel aqueous slurry composition for polishing/planarization of a substrate. The composition includes silicon dioxide abrasive particles wherein the abrasive particles are anionically modified/doped with metallate anions selected from the group consisting of aluminate, stannate, zincate and plumbate, thereby providing a high negative surface charge to the abrasive particles and enhances the stability of the slurry composition. |
申请公布号 |
WO2006028759(A3) |
申请公布日期 |
2006.12.21 |
申请号 |
WO2005US30560 |
申请日期 |
2005.08.30 |
申请人 |
PRAXAIR S. T. TECHNOLOGY, INC;BELOV, IRINA |
发明人 |
BELOV, IRINA |
分类号 |
C09G1/02;C09G1/04;C09K3/14 |
主分类号 |
C09G1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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