发明名称 MICROLENS FORMING METHOD OF SOLID-STATE IMAGING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a microlens forming method of a solid-state imaging apparatus that can make pattern intervals of microlens patterns narrow so as to improve light convergence efficiency. SOLUTION: In the microlens forming method, after microlens patterns 16 and microlenses 17 formed on a substrate 10 are covered with a coating 18 of a coating forming agent for pattern microfabrication, heating is carried out if needed. Consequently, pattern intervals W of the microlenses 17 can be made narrow. The step for coating may be performed after formation of the microlens patterns (E<SB>1</SB>) or after bleaching (F<SB>1</SB>) (W<SB>0</SB>>W<SB>1</SB>) like a process (E<SB>1</SB>/F<SB>1</SB>), or after formation of the microlenses 17 by a thermal flow (W<SB>2</SB>>W<SB>3</SB>) like a process (H<SB>1</SB>). COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009059959(A) 申请公布日期 2009.03.19
申请号 JP20070226854 申请日期 2007.08.31
申请人 TOKYO OHKA KOGYO CO LTD 发明人 YOSHIDA MASAAKI;UENO NAOHISA;SUGIMOTO YASUAKI
分类号 H01L27/14;G02B3/00;H04N5/335;H04N5/369 主分类号 H01L27/14
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