发明名称 ZnO膜の製造装置及び製造方法
摘要 A ZnO film production method includes: disposing a substrate on an installation base; and, while supplying chlorine gas from a chlorine gas supply source to a first raw material storing part R1 and supplying oxygen gas from a third gas supply source (oxygen gas supply source) G3 into a reaction container, controlling heating units (heaters H1, H2 and H3) with a control device CONT such that temperature T1 of the first raw material storing part R1, temperature T2 of a second raw material storing part R2 and temperature T3 of the installation base on which the substrate is disposed satisfy a relationship of T1<T2<T3. Thus, according to the production method of the present disclosure, it is possible to produce a high-quality ZnO film.
申请公布号 JP5943345(B2) 申请公布日期 2016.07.05
申请号 JP20120167481 申请日期 2012.07.27
申请人 東京エレクトロン株式会社;国立大学法人東京農工大学 发明人 康 松潤;熊谷 義直;纐纈 明伯
分类号 C23C16/448;C23C16/40;H01L21/205 主分类号 C23C16/448
代理机构 代理人
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