SPATIALLY LIMITED PROCESSING OF A SUBSTRATE

摘要

A method of chemical processing includes passing a substrate material from a first transfer conveyor device to a second transfer conveyor device across a fluid reservoir so that a first surface of the substrate contacts a fluid within the reservoir and a second surface of the substrate is substantially untouched by the fluid within the reservoir and the first and second transfer conveyor devices are placed substantially outside of the reservoir.

主权项

1. A chemical processing device comprising:
a reservoir having a first edge and a second edge; a first conveyor device disposed adjacent to said first edge; a second conveyor device disposed adjacent to said second edge such that said first and second edges are disposed between said first and second conveyor devices, said second conveyor device being adapted to receive and support a substrate material from said first conveyor device, whereby one surface of said substrate material contacts a fluid material disposed within said reservoir during a transition from said first conveyor device to said second conveyor device while a further surface of said substrate material remains substantially un-contacted by said fluid material.