| 摘要 |
A light exposure device forms a pattern without the light exposure stain. The light exposure device provided with DMD regulates a plurality of dividing light exposure regions with respect to a light exposure area, and performs multiple light exposure operation while shifting the same to a buffer memory in order with respect to the light exposure operation after containing the light exposure data in the dividing light exposure regions on the front head in the buffer memory (38A). In addition, when producing mask data and being contained in the mask memory, a reading address is changed with respect to a mask memory per light exposure operation, to circulate and shift the mask data per row data. |
