Photoresist composition

摘要

A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula:
(Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X
wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

主权项

1. A composition comprising:
an acid-sensitive polymer, and a cyclic sulfonium compound having the formula:
(Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n—(L)p—X or the formula:
(Ra)1—(Ar)—S+(—CH2—)m· wherein Ra is isopropyl, t-butyl, cyclopentyl, or cyclohexyl, Ar is para-phenylene, each Rb is independently F or a linear C1-4 perfluoroalkyl group, L is a C1-30 linking group including an C(═O)—NR— or —O—C(═O)—NR— moiety, wherein R is H or X, X is a substituted or unsubstituted, C5 or greater polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, Z1 is —O— or —O—C(═O)—, R18 to R21 are independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, R22 is norbornyl, cholate, a C8 caged lactone, or a 1- or 2-adamantyl group optionally comprising an —OH, —OCH3, or —OCF3 group, and 1 is 1, m is 4, n is 2, p is 1, r is 2 to 4, and s is 0 to 4, provided that when Z1 is —O—C(═O)— and s is 0, r is 4, wherein the acid-sensitive polymer comprises: (i) a structural unit comprising a monocyclic acid-cleavable group protecting a base-soluble group, (ii) a structural unit comprising a polycyclic acid-cleavable group protecting a base-soluble group, wherein the structural unit having the monocyclic or polycyclic acid-cleavable protective group is derived from a monomer having the formula:
H2C═C(Rc)—C(═O)—O-A1 wherein Rc is H, C1-6 alkyl, F, or CF3 and A1 is a C4-50 tertiary alkyl-containing group in which a tertiary center of A1 is connected to an ester oxygen atom of the monomer, or a monomer having the formula:
H2C═C(Rd)—C(═O)—O—C(Re)2—O—(CH2)o-A2 wherein Rd is H, C1-6 alkyl, F, or CF3, each Re is independently H or a C1-4 alkyl group, A2 is a C1-30 cycloaliphatic group, and o is an integer of 0-4, (iii) a structural unit derived from a lactone monomer, and (iv) a structural unit derived from a polar monomer comprising a hydrogen donor group.