发明名称
摘要 <p>PROBLEM TO BE SOLVED: To provide a process for producing an optical waveguide element capable of forming an indium-containing transparent oxide electrode which comes into contact with an optical waveguide consisting of a ferroelectric thin film without impairing the electro-optic characteristics of the optical waveguide element. SOLUTION: This process for producing the optical waveguide element has an optical waveguide forming stage for forming the optical waveguide consisting of the ferroelectric thin film on a substrate, an electrode forming stage for forming the indium-containing transparent oxide electrode which comes into contact with the optical waveguide to a prescribed shape at a temperature above 0 deg.C and below 150 deg.C in an oxygen-containing atmosphere and an annealing treatment stage for subjecting the formed transparent oxide electrode to an annealing treatment.</p>
申请公布号 JP4412796(B2) 申请公布日期 2010.02.10
申请号 JP20000053222 申请日期 2000.02.29
申请人 发明人
分类号 G02B6/12;G02F1/31 主分类号 G02B6/12
代理机构 代理人
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