| 摘要 |
PROBLEM TO BE SOLVED: To drive an exposure apparatus capable of realizing transfer of a pattern onto a substrate with little defocus without necessarily providing a focal position detection system or the like.SOLUTION: A wafer W and a table TB on which the wafer is mounted is sandwiched by a water pressure pad 32 and a water pressure pad 34. The water pressure pad maintains a gap between a bearing surface of the pad and the wafer regarding an optical axis direction of a projection optical system at a predetermined dimension. Further, because the water pressure pad utilizes static pressure of non-compressive fluid (liquid) between the bearing surface and an object to be supported (substrate), rigidity of the bearing is high, and a gap between the bearing surface and the substrate is maintained stably and at a constant level. Further, the liquid has higher viscosity than gas, and has satisfactory vibration damping properties.SELECTED DRAWING: Figure 1 |
