| 发明名称 |
SUPPORT STAGE FOR VACUUM APPARATUS |
| 摘要 |
Apparatus for supporting a substrate (11) in respect of a vacuum system comprising a vacuum chamber, a cooling system (12), and a cradle (6) for supporting a substrate holder and configured such that, in use, the substrate holder is thermally coupled with said cooling system, the apparatus comprising a substrate holder (20, 20′) comprising a thermally conductive diaphragm spring (9, 9′) mounted within a support ring and defining a slot (11a) therebetween for receiving a substrate (11), in use. |
| 申请公布号 |
US2016204021(A1) |
申请公布日期 |
2016.07.14 |
| 申请号 |
US201514983063 |
申请日期 |
2015.12.29 |
| 申请人 |
UHV Design Limited |
发明人 |
Coxon Peter |
| 分类号 |
H01L21/687;C23C14/58;H01L21/67 |
主分类号 |
H01L21/687 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. Apparatus for supporting a substrate in respect of a vacuum system comprising a vacuum chamber, a cooling system, and a cradle for supporting a substrate holder and configured such that, in use, the substrate holder is thermally coupled with said cooling system, the apparatus comprising a substrate holder comprising a thermally conductive diaphragm spring mounted within a support ring and defining a slot therebetween for receiving a substrate, in use. |
| 地址 |
Laughton GB |
